相似文献/References:
[1]庄庆德,郑其经,陈德英,等.单晶硅/多晶硅同步定积过程中的边缘效应及二维扩散滞流层模型[J].东南大学学报(自然科学版),1982,12(2):105.[doi:10.3969/j.issn.1001-0505.1982.02.009]
Zhuong Qing-de,Zheng Qi-jing,Chen De-ying,et al.Fringe Effect During EPI/Polysilicon Co-Deposition and a Model of Two-Dimensional Diffusion in the stagnant Layer[J].Journal of Southeast University (Natural Science Edition),1982,12(2):105.[doi:10.3969/j.issn.1001-0505.1982.02.009]